Glucose sensor based on a field-effect transistor with a photolithographically patterned glucose oxidase membrane |
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Authors: | Y. Hanazato M. Nakako M. Maeda S. Shiono |
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Affiliation: | Central Research Laboratory, Mitsubishi Electric Corporation 1-1, Tsukaguchi-Honmachi 8-Chome, Amagasaki, Hyogo 661 Japan |
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Abstract: | A photopolymer solution consisting of polyvinylpyrrolidone and 2,5-bis(4′-azido-2′-sulfobenzal)cyclopentanone is used to make a patterned glucose oxidase membrane for a FET-glucose sensor by photolithography. A small patterned glucose oxidase membrane, 0.2 mm wide and 1 mm long, is made on the gate surface of an ISFET by developing a photocross-linked glucose oxidase membrane with aqueous 1–3% glutaraldehyde solution. The optimum composition of the enzyme/photopolymer solution is described. The sensor with the patterned membrane showed linear response to glucose concentration from 0.3 to 2.2 mM and useful response up to 5 mM. |
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