A Study of Electron Beam Induced Deposition and Nano Device Fabrication Using Liquid Cell TEM Technology |
| |
| Authors: | Xin Chen Lihui Zhou Ping Wang Hongliang Cao Xiaoli Miao Feifei Wei |
| |
| Institution: | 1. Key Laboratory for Ultrafine Materials of Ministry of Education, and Shanghai Key Laboratory of Advanced Polymeric Materials, School of Materials Science and Engineering, East China University of Science and Technology, Shanghai 200237, China;2. Department of Materials Science and Engineering, University of Illinois at Urbana‐Champaign, Urbana, IL 61801, USA;3. State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China;4. East China University of Science and Technology, Shanghai 200237, China;5. State Key Laboratory of Bioreactor Engineering, Biomedical Nanotechnology Center, East China University of Science and Technology, Shanghai 200237, China |
| |
| Abstract: | SiCx nano dots and nano wires with sizes from 60 nm to approximately 2 µm were fabricated using liquid cell transmission electron microscope (TEM) technology. A SiCl4 in CH2Cl2 solution was sealed between two pieces of Si3N4 window grids in an in situ TEM liquid cell. Focused 200 keV electron beams were used to bombard the sealed precursors, which caused decomposition of the precursor materials, and deposition of the nano materials on the Si3N4 window substrates. The size of nano dots increased with beam exposure time, following an approximately exponential relationship with the beam doses. Secondary electrons are attributed as the primary sources for the Si and C reduction. A nano device was formed from a deposited nano wire, with its electrical property characterized. |
| |
| Keywords: | electron beam induced deposition in situ TEM nanolithography nanodevices |
|
|
