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考虑溅射损失的RF共振法离子引出和收集
引用本文:谢国锋,王德武,应纯同. 考虑溅射损失的RF共振法离子引出和收集[J]. 物理学报, 2005, 54(5): 2147-2152
作者姓名:谢国锋  王德武  应纯同
作者单位:清华大学工程物理系,北京 100084
摘    要:采用PIC-MCC方法研究了AVLIS工程中一维RF共振法离子引出和收集过程,重点研究离子在收 集板上造成的溅射损失以及离子的收集效率.模拟结果表明,RF共振法与平行板静电场法相 比,引出时间较短,碰撞损失和溅射损失较低,收集率较高;增加引出电压,可以缩短引出 时间,降低碰撞损失,但是增加了溅射损失,使得收集率降低;增大磁场强度,使碰撞损失 降低,溅射损失增加,收集率降低.关键词:AVLISPIC-MCC离子引出溅射

关 键 词:AVLIS  PIC-MCC  离子引出  溅射
文章编号:1000-3290/2005/54(05)2147-06
收稿时间:2004-08-18

Ions extraction and collection using the RF resonance method and taking into consideration the sputtering loss
Xie Guo-Feng,Wang De-Wu,Ying Chun-Tong. Ions extraction and collection using the RF resonance method and taking into consideration the sputtering loss[J]. Acta Physica Sinica, 2005, 54(5): 2147-2152
Authors:Xie Guo-Feng  Wang De-Wu  Ying Chun-Tong
Abstract:One_dimensional ions extraction and collection using the RF resonance method is studied by PIC-MCC simulation. The energy and angle distribution of extracted ions is recorded and the sputtering loss is calculated. The results show that compared with parallel electrode method, RF resonance method has advantages such as shorter extraction time, lower collision loss and sputtering loss and higher col lection ratio; the extraction time and collision loss are decreased with increas ing extraction voltage, but the sputtering loss increases and collection ratio d ecreases; collision loss is decreased with increasing magnetic field, but the sp uttering loss increases and collection ratio decreases.
Keywords:AVLIS  PIC-MCC  ion extraction   sputtering
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