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Stable deacon process for HCl oxidation over RuO2
Authors:Crihan Daniela  Knapp Marcus  Zweidinger Stefan  Lundgren Edvin  Weststrate Cornelis J  Andersen Jesper N  Seitsonen Ari P  Over Herbert
Institution:1. Physikalisch‐Chemisches Institut, Justus‐Liebig‐Universit?t, Heinrich‐Buff‐Ring 58, 35392 Gie?en, Germany, Fax: (+49)?641‐99‐34559 http://www.uni‐giessen.de/pci/Homepage_Over;2. Department of Synchrotron Radiation Research, University of Lund, S?lvegatan 14, 22362 Lund, Sweden;3. IMPC, CNRS & Université Pierre et Marie Curie, 4 place Jussieu, case 115, 75252 Paris, France
Abstract:
Keywords:Deacon process  heterogeneous catalysis  oxide surfaces  ruthenium dioxide  surface chemistry
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