Application of FT-Raman spectroscopy to the study of the benzotriazole inhibition of acid copper corrosion |
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| Affiliation: | 1. School of Materials Science and Engineering, University of Shanghai for Science and Technology, Shanghai 200093, PR China;2. School of Mechanical Engineering, University of Shanghai for Science and Technology, Shanghai 200093, PR China;3. Key Laboratory of Inorganic Coating Materials, Chinese Academy of Sciences, Shanghai 200050, PR China;1. Department of Mechanical Engineering, Carnegie Mellon University, Pittsburgh, PA 15213, United States;2. School of Mechanical and Materials Engineering, Washington State University, Pullman, WA 99164, United States |
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| Abstract: | The initial stages of the corrosion protection of copper surfaces by benzotriazole in sulfuric acid solution are investigated using FT-Raman SERS and X-ray photoelectron spectroscopy. Spectra are measured in the presence of ppm levels of inhibitor on a copper surface in situ. The dependence of the adsorbate spectra on the electrode potential, solution pH, oxidation/reduction cycles and time is observed. Good spectra are obtained from copper electrodes prepared using in situ oxidation/reduction cycling in low pH sulfate solutions free from chloride at negative potentials. |
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