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Single and double IR laser multiphoton decomposition of trifluoromethylsilane
Institution:Instituto de Optica “Daza Valdéz” C.S.I.C., Serrano 121 28006 Madrid, Spain;Anorganische Chemie FB 9, Universität W-5600 Wuppertal 1, Germany;Institute of Chemical Process Fundamentals Academy of Sciences of the Czech Republic 16502 Prague 6 Suchdol, Czech Republic
Abstract:Single and double IR laser multiphoton decomposition of trifluoromethylsilane have been studied at 0.1 and 0.3 mbar. The IRMPD products FSiH3 and C2H4 form independently of the wavelength of the laser pulses both in the single and double laser experiments. The decomposition rate is however very sensitive to both the wavenumber of the irradiation and the time delay between the two laser pulses at different wavenumbers.
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