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Quantitative determination of oxygen in silicon by combination of FTIR-spectroscopy,inert gas fusion analysis and secondary ion mass spectroscopy |
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| Authors: | Stingeder G. Gara S. Pahlke S. Schwenk H. Guerrero E. Grasserbauer M. |
| Affiliation: | 1.Institute of Analytical Chemistry, Technical University Vienna, Getreidemarkt 9/151, A-1060, Wien, Austria ;2.Wacker-Chemitronic, D-8263, Burghausen, Federal Republic of Germany ; |
| Abstract: | Analytical and Bioanalytical Chemistry - VLSI devices are almost exclusively fabricated on Czochralski (CZ) silicon containing high concentrations of interstitially dissolved oxygen ([Oi] ∼... |
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