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不同腐蚀时间对CZT(211)B衬底的影响分析
引用本文:吴亮亮,王经纬,高达,王丛,刘铭,周立庆.不同腐蚀时间对CZT(211)B衬底的影响分析[J].激光与红外,2018,48(10):1268-1273.
作者姓名:吴亮亮  王经纬  高达  王丛  刘铭  周立庆
作者单位:华北光电技术研究所,北京 100015
摘    要:主要分析了不同溴甲醇(溴体积比为0.05%)腐蚀时间对CZT(211)B衬底表面粗糙度、总厚度偏差、红外透过率、Zn值以及X射线衍射半峰宽(FWHM)的影响。研究发现即使使用溴体积比0.05%的溴甲醇溶液腐蚀5 s,衬底表面粗糙度都会由0.5 nm增加至1.5 nm以上。随着腐蚀时间的增加CZT(211)B衬底总厚度偏差逐渐增加。使用溴甲醇作为抛光液的两个样品的Zn值明显低于使用氨水作为抛光液的样品,同时该两样品的X射线衍射半峰宽和红外透过率随腐蚀时间的变化趋势一致,但不同于使用氨水作为抛光液的样品,说明不同的抛光液影响CZT(211)B衬底表面Zn值以及表面损伤层等表面状态。

关 键 词:碲锌镉  溴甲醇  表面粗糙度  总厚度偏差

Analysis of etching time influence on CZT (211) B substrate
WU Liang-liang,WANG Jing-wei,GAO D,WANG Cong,LIU Ming,ZHOU Li-qing.Analysis of etching time influence on CZT (211) B substrate[J].Laser & Infrared,2018,48(10):1268-1273.
Authors:WU Liang-liang  WANG Jing-wei  GAO D  WANG Cong  LIU Ming  ZHOU Li-qing
Institution:North China Research Institute of Electro-Optics,Beijing 100015,China
Abstract:The influence of etching time (bromomethanol,bromine volume ratio of 0.05%) on the surface roughness,total thickness variation,infrared transmittance,Zn value and half width at half maxima of X ray diffraction (FWHM) of CZT (211) B substrate were analyzed,in the paper.It was found that the surface roughness of the substrate increased from 0.5 nm to 1.5 nm even if the bromine methanol solution,which bromine volume ratio is 0.05%,was used for 5 seconds.With the increase of etching time,the total thickness deviation (TTV) of CZT (211) B substrate gradually increases.The Zn value of two samples using bromomethanol as the polishing solution was significantly lower than that using ammonia as the polishing solution.Meanwhile,the FWHM and infrared transmittance of the two samples were consistent with variation trend of etching time,but different from that using ammonia as the polishing solution.It is indicated that different polishing solution affect the surface state of CZT (211) B substrate,such as Zn value and surface damage layer.
Keywords:CdZnTe  bromomethanol  surface roughness  TTV
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