Electrical characteristics of poly(methylsilsesquioxane) thin films for non-volatile memory |
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Authors: | Zubair Ahmad PC Ooi MH Sayyad |
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Institution: | a Department of Mechanical Engineering, University of Auckland, 20 Symonds Street Auckland, New Zealandb Ghulam Ishaq Khan Institute of Engineering Sciences and Technology, Topi-23640, Swabi, Pakistan |
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Abstract: | In this communication the electrical characteristics of poly(methylsilsesquioxane) (PMSSQ) thin films and the possibility of charge storage in the Au nanoparticle embedded PMSSQ film base memory element have been studied. PMSSQ films were sandwiched between Al and Si electrodes to fabricate metal-polymer-semiconductor (MPS) structures. The conduction mechanism in PMSSQ films has been investigated. The charge transport mechanism appears to be space charge limited current (SCLC) at the higher-voltage region. Various electrical parameters such as reverse saturation current, barrier height, ideality factor, rectification ratio, shunt and series resistance and charge carrier mobility in PMSSQ have been determined. C-V analysis is performed to confirm the memory effect for Au nanoparticles embedded MPS structures. A definite clockwise hysteresis is observed which indicates the possibility of charge storage in the Au nanoparticles embedded PMSSQ film. |
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Keywords: | A Polymethylsilsesquioxane B Spin casting C Metal-polymer-semiconductor (MPS) structure D Non-volatile memory |
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