首页 | 本学科首页   官方微博 | 高级检索  
     检索      


Electrical characteristics of poly(methylsilsesquioxane) thin films for non-volatile memory
Authors:Zubair Ahmad  PC Ooi  MH Sayyad
Institution:
  • a Department of Mechanical Engineering, University of Auckland, 20 Symonds Street Auckland, New Zealand
  • b Ghulam Ishaq Khan Institute of Engineering Sciences and Technology, Topi-23640, Swabi, Pakistan
  • Abstract:In this communication the electrical characteristics of poly(methylsilsesquioxane) (PMSSQ) thin films and the possibility of charge storage in the Au nanoparticle embedded PMSSQ film base memory element have been studied. PMSSQ films were sandwiched between Al and Si electrodes to fabricate metal-polymer-semiconductor (MPS) structures. The conduction mechanism in PMSSQ films has been investigated. The charge transport mechanism appears to be space charge limited current (SCLC) at the higher-voltage region. Various electrical parameters such as reverse saturation current, barrier height, ideality factor, rectification ratio, shunt and series resistance and charge carrier mobility in PMSSQ have been determined. C-V analysis is performed to confirm the memory effect for Au nanoparticles embedded MPS structures. A definite clockwise hysteresis is observed which indicates the possibility of charge storage in the Au nanoparticles embedded PMSSQ film.
    Keywords:A  Polymethylsilsesquioxane  B  Spin casting  C  Metal-polymer-semiconductor (MPS) structure  D  Non-volatile memory
    本文献已被 ScienceDirect 等数据库收录!
    设为首页 | 免责声明 | 关于勤云 | 加入收藏

    Copyright©北京勤云科技发展有限公司  京ICP备09084417号