首页 | 本学科首页   官方微博 | 高级检索  
     检索      


Substrate-dependent structure, microstructure, composition and properties of nanostructured TiN films
Authors:MSRN Kiran  M Ghanashyam Krishna  KA Padmanabhan
Institution:
  • a School of Physics, University of Hyderabad, Hyderabad-500 046, India
  • b Department of Materials Engineering, Indian Institute of Science, Bangalore-560 012, India
  • c Centre for Nanotechnology, University of Hyderabad, Hyderabad-500 046, India
  • d School of Engineering Sciences and Technology, University of Hyderabad, Hyderabad-500 046, India
  • e Institute of Materials Physics, University of Muenster, Germany
  • Abstract:Titanium nitride films of a thickness of ∼1.5 μm were deposited on amorphous and crystalline substrates by DC reactive magnetron sputtering at ambient temperature with 100% nitrogen in the sputter gas. The growth of nanostructured, i.e. crystalline nano-grain sized, films at ambient temperature is demonstrated. The microstructure of the films grown on crystalline substrates reveals a larger grain size/crystallite size than that of the films deposited on amorphous substrates. Specular reflectance measurements on films deposited on different substrates indicate that the position of the Ti-N 2s band at 2.33 eV is substrate-dependent, indicating substrate-mediated stoichiometry. This clearly demonstrates that not only structure and microstructure, but also chemical composition of the films is substrate-influenced. The films deposited on amorphous substrates display lower hardness and modulus values than the films deposited on crystalline substrates, with the highest value of hardness being 19 GPa on a lanthanum aluminate substrate.
    Keywords:A  Thin films  D  Optical properties  D  Mechanical properties
    本文献已被 ScienceDirect 等数据库收录!
    设为首页 | 免责声明 | 关于勤云 | 加入收藏

    Copyright©北京勤云科技发展有限公司  京ICP备09084417号