Nonlinear-optical and structural properties of nanocrystalline silicon carbide films |
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| Authors: | M S Brodyn V I Volkov V R Lyakhovetskii V I Rudenko V M Puzilkov A V Semenov |
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| Institution: | 1.Institute of Physics,National Academy of Sciences of Ukraine,Kiev,Ukraine;2.Institute of Monocrystals,National Academy of Sciences of Ukraine,Kharkov,Ukraine |
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| Abstract: | The aim of this study is to investigate the nonlinearity of refraction in nanostructured silicon carbide films depending on
their structural features (synthesis conditions for such films, substrate temperature during their deposition, concentration
of the crystalline phase in the film, Si/C ratio of atomic concentrations in the film, and size of SiC nanocrystals formed
in the film). The corresponding dependences are obtained, as well as the values of nonlinear-optical third-order susceptibility
χ(3)(ω; ω, −ω, ω) for various silicon polytypes (3C, 21R, and 27R) which exceed the value of χ(3) in bulk silicon carbide single crystals by four orders of magnitude. |
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