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闭合状态对磁控溅射Cr镀层生长过程的影响
引用本文:栾亚,丁小柯,蒋百灵,鲁媛媛.闭合状态对磁控溅射Cr镀层生长过程的影响[J].人工晶体学报,2009,38(4):924-929.
作者姓名:栾亚  丁小柯  蒋百灵  鲁媛媛
作者单位:西安理工大学材料科学与工程学院,西安,710048
基金项目:国家高技术研究发展计划(863计划) 
摘    要:利用非平衡磁控溅射离子镀技术于不同磁场闭合状态下在单晶硅基体上制备出Cr膜,采用扫描电子显微镜和X射线衍射仪观察并分析了不同闭合状态下镀层的微观形貌和晶体择优生长趋势.结果表明:闭合状态显著影响着Cr膜生长过程中的柱状晶取向和致密度.不闭合状态下,Cr膜截面组织为典型疏松的柱状晶体组织,镀层沿(110)面择优生长;半闭合状态下,Cr膜截面组织为较致密的柱状晶体组织,在不同生长时期,镀层沿(110)或(200)面择优生长;完全闭合状态下,Cr膜截面组织在初始1 μm范围内,为致密纤维状晶体组织,随后呈现致密的无明显柱状晶体形貌,镀层沿(200)面择优生长.

关 键 词:闭合状态  磁控溅射  择优取向  

Influence of Closed-state on Growth of Cr Coating by Magnetron Sputtering
LUAN Ya,DING Xiao-ke,JIANG Bai-ling,LU Yuan-yuan.Influence of Closed-state on Growth of Cr Coating by Magnetron Sputtering[J].Journal of Synthetic Crystals,2009,38(4):924-929.
Authors:LUAN Ya  DING Xiao-ke  JIANG Bai-ling  LU Yuan-yuan
Institution:School of Materials Science and Engineering;Xi'an University of Technology;Xi'an 710048;China
Abstract:Cr coatings were deposited on the surface of Si substrates at different closed-state of magnetic field using unbalanced sputtering ion plating system.The SEM,XRD were used respectively to analyze the influence of closed-state of magnertic field on microstructure and preferred orientation of Cr coatings.The results show that the changes of closed-state of magnertic field significantly affected on crystal orientation and tightness of Cr coatings.Loose columnar grains are obtained at unclosed state and the pre...
Keywords:closed-state  magnetron sputtering  preferred orientation  
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