N+离子注入聚四氟乙烯表面改性研究

在剂量为1×1014—1×1017ions／cm2的范围内，在不同的温度条件下，用 能量为160keV氮离子对PTFE表面进行注入处理，处理后的样品用可见(514．5nm)和傅里叶红 外(1064nm)拉曼(Raman)光谱以及扫描电镜和x射线能谱仪进行检测.实验结果表明低剂量注 入可以增强PTFE晶体结构的取向和有序性；中等剂量时溅射损失效应明显，表面粗糙度加大 ：高剂量注入时微观结构强烈地变化并生成CC双键，导致表面碳化.另外温度对表面改性效 果有很大的影响.刻蚀率和表面的微观结构的变化随着温度的升高而增强.离子注入前，用喷 射技术使样品覆盖一层150nm的金膜，薄膜的黏结性和硬度用划痕和透明胶带测试配合扫描 电镜进行分析.分析结果表明，黏结性在注入剂量为1014ions／cm2时明显增强，这 个结果与表面亲水性测量结果是一致的.但表面硬度只在温度为180℃时才得到了增强. 关键词： 离子注入 聚四氟乙烯 表面改性

Study on surface modification of polytetrafluoroethylene by N+ ion implantation

The polytetra_fluoroethylene (PTFE) substrates were implanted with 160 kev N ions to a dose range between 1×１0１4 and １×１017 ions/cm2 at di fferent temperatures. The treated samples were examined by visible (5145 nm) a nd Fourier transform infrared (1064 nm) Raman spectroscopy as well as by scannin g electron microscopy. Ion implantation on PTFE in the low dose range leads to e nhancement of crystallinity of PTFE. In the intermediate dose range, sputter los s effects are dominant and the roughness of the surface increases. At higher dos es, the microstructure strongly evolves and double CC bonds are created. In addi tion, the etching yield and the changing extent of the surface microstructure ar e enhanced by the temperature of PTFE substrate.