Estimation of applicability of perturbation theory to solution of the kinetic Boltzmann equation in calculations of charge-carrier relaxation time in isotropic polycrystalline <Emphasis Type="Italic">p-</Emphasis>silicon |
| |
Authors: | A G Moiseev |
| |
Institution: | 1.Novosibirsk State Technical University,Novosibirsk,Russia |
| |
Abstract: | A condition is formulated for application of perturbation theory to solution of the kinetic Boltzmann equation in calculations
of charge-carrier relaxation time in an isotropic silicon polycrystal, where holes are scattered both by a disordered system
of potential barriers formed on crystallite surfaces and by a disordered lattice of silicon atoms characterized by local ordering.
The total specific resistance of p-type isotropic polycrystalline silicon is estimated for the grain size d = 230 ?, temperature T = 300 K, and hole concentration p = (5.0 – 10.0) ⋅ 1019 cm−3. The calculated specific resistances of p-type polycrystalline silicon are compared with the experimental data. |
| |
Keywords: | |
本文献已被 SpringerLink 等数据库收录! |
|