| Electron field emission characteristics of nano-catkin carbon films deposited by electron cyclotron resonance microwave plasma chemical vapour deposition |
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| 作者姓名： | 顾广瑞 吴宝嘉 金 哲 Ito Toshimichi |
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| 作者单位： | Department of Physics, College of Science,Yanbian University, Yanji 133002, China;Department of Physics, College of Science,Yanbian University, Yanji 133002, China;Department of Physics, College of Science,Yanbian University, Yanji 133002, China;Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, Osaka 565-0871, Japan |
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| 摘 要： | This paper reported that the nano-catkin carbon films were prepared on Si substrates by means of electron cyclotron resonance microwave plasma chemical vapour deposition in a hydrogen and methane mixture. The surface morphology and the structure of the fabricated films were characterized by using scanning electron microscopes and Raman spectroscopy, respectively. The stable field emission properties with a low threshold field of 5V/μm corresponding to a current density of about 1μA/cm^2 and a current density of 3.2mA/cm^2 at an electric field of 10V/μm were obtained from the carbon film deposited at CH4 concentration of 8%. The mechanism that the threshold field decreased with the increase of the CH4 concentration and the high emission current appeared at the high CH4 concentration was explained by using the Fowler-Nordheim theory.
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| 关 键 词： | 场致发射 炭膜 纳米颗粒 微波等离子体 |
| 收稿时间： | 2007-04-22 |
| 修稿时间： | 2007-06-25 |
Electron field emission characteristics of nano-catkin carbon films deposited by electron cyclotron resonance microwave plasma chemical vapour deposition |
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| Gu Guang-Rui,Wu Bao-Ji,Jin Zhe and Ito Toshimichi.Electron field emission characteristics of nano-catkin carbon films deposited by electron cyclotron resonance microwave plasma chemical vapour deposition[J].Chinese Physics B,2008,17(2):716-720. |
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| Authors: | Gu Guang-Rui Wu Bao-Ji Jin Zhe and Ito Toshimichi |
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| Institution: | Department of Physics, College of Science,Yanbian University, Yanji 133002, China; Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, Osaka 565-0871, Japan |
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| Abstract: | field emission, carbon films, nano-catkin, microwave plasma chemical vapour deposition |
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| Keywords: | field emission carbon films nano-catkin microwave plasma chemical vapour deposition |
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