Recent progress in quantitative and high spatial resolution AES |
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Authors: | Hofmann Siegfried |
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Affiliation: | (1) Max-Planck-Institut für Metallforschung, Institut für Werkstoffwissenschaft, Seestrasse 92, D-70174 Stuttgart, Federal Republic of Germany |
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Abstract: | Progress in high resolution Auger electron spectroscopy (HR-AES or scanning Auger microscopy, SAM) during the past few years is characterized by the use of efficient field emission electron sources, parallel detection capabilities and improved data acquisition, storage and processing, thus enhancing spatial resolution (to about 10 nm), signal to noise figure and quantification of elements in different chemical bonding states, e.g. by routinely using factor analysis. Optimized ion sputtering facilities, particularly sample rotation, enable depth profiling with high, depth independent resolution. The basic features of SAM are discussed with respect to EPMA (electron probe micro-analysis), emphasizing fundamental limitations and future developments. |
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Keywords: | surface analysis Auger electron spectroscopy scanning Auger microscopy spatial resolution backscattering of electrons |
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