Nanomechanical characterization of amorphous hydrogenated carbon thin films |
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| Authors: | Te-Hua Fang |
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| Institution: | a Institute of Mechanical and Electromechanical Engineering, National Formosa University, Yunlin 632, Taiwan
b Department of Mechanical Engineering, Kun Shan University, Tainan 710, Taiwan |
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| Abstract: | Amorphous hydrogenated carbon (a-C:H) thin films deposited on a silicon substrate under various mixtures of methane-hydrogen gas by electron cyclotron resonance microwave plasma chemical vapor deposition (ECR-MPCVD) was investigated. Microstructure, surface morphology and mechanical characterizations of the a-C:H films were analyzed using Raman spectroscopy, atomic force microscopy (AFM) and nanoindentation technique, respectively. The results indicated there was an increase of the hydrogen content, the ratio of the D-peak to the G-peak (ID/IG) increased but the surface roughness of the films was reduced. Both hardness and Young's modulus increased as the hydrogen content was increased. In addition, the contact stress-strain analysis is reported. The results confirmed that the mechanical properties of the amorphous hydrogenated carbon thin films improved using a higher H2 content in the source gas. |
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| Keywords: | Nanoindentation Amorphous hydrogenated carbon films ECR-MPCVD Raman spectra AFM |
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