Composition spread metal thin film fabrication technique based on ion beam sputter deposition |
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| Authors: | P Ahmet T Nagata S Yagyu M Yoshitake |
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| Institution: | a Nanomaterials Laboratory, National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan
b CREST-Japan Science and Technology Corporation, Japan |
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| Abstract: | A composition spread metal thin film fabrication technique based on ion beam sputter deposition method was developed. The technique enables us to fabricate any desired part or a complete binary/ternary composition spread metal thin films onto a single substrate by sequentially sputtering different target materials. Composition spread metal thin films can be deposited directly on a dielectric film in patterned electrode shape for C-V and I-V measurements. The system could be especially useful in the search for new multi-component metal gate materials. |
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| Keywords: | 85 40 Sz 81 15 Cd 81 30 Bx 85 40 Ls 73 40 Qv |
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