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Fabrication of combinatorial nm-planar electrode array for high throughput evaluation of organic semiconductors
Authors:M Haemori  T Edura  K Itaka  Y Wada  H Koinuma
Institution:a Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
b Nanotechnology Research Laboratory, Waseda University 513 Wasedatsurumaki, Shinjuku-ku, Tokyo 162-0041, Japan
c CREST-JST, 4-1-8 Honcho, Kawaguchi, Saitama 332-0012, Japan
d NIMS-COMET, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan
Abstract:We have fabricated a combinatorial nm-planar electrode array by using photolithography and chemical mechanical polishing processes for high throughput electrical evaluation of organic devices. Sub-nm precision was achieved with respect to the average level difference between each pair of electrodes and a dielectric layer. The insulating property between the electrodes is high enough to measure I-V characteristics of organic semiconductors. Bottom-contact field-effect-transistors (FETs) of pentacene were fabricated on this electrode array by use of molecular beam epitaxy. It was demonstrated that the array could be used as a pre-patterned device substrate for high throughput screening of the electrical properties of organic semiconductors.
Keywords:42  82  Cr
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