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Combinatorial synthesis of Li-doped NiO thin films and their transparent conducting properties |
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| Authors: | U.S. Joshi Y. Matsumoto K. Itaka H. Koinuma |
| Affiliation: | a Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagastuda-tyo, Midori-ku, Yokohama 226-8503, Japan b Department of Physics, Veer Narmad South Gujarat University, Surat 395 007, India c Frontier and Collaborative Research Center, Tokyo Institute of Technology, 4259 Nagastuda-tyo, Midori-ku, Yokohama 226-8503, Japan d Department of Electrical Engineering, Sizuoka University, 3-5-1 Johoku Hamamatsu-shi, Shizuoka 432-8529, Japan e COMET, National Institute of Materials Science, 1-1 Namiki, Tsukuba, Ibaraki, Japan f CREST-Japan Science and Technology Corporation, Tokyo 103-0027, Japan |
| Abstract: | Transparent and conductive oxide (TCO) thin films of Li-doped NiO were prepared by combinatorial pulsed laser deposition technique. Composition spread approach was applied to optimize the Li concentration for achieving high conductivity and transparency in the film. Conductivity of the composition spread film was found to increase almost linearly from nearly insulating to as high as 1.41 Ω−1 cm−1 with increasing Li content along a 9 mm long film. Optical transparency was found to decrease in an equal proportion across the 40 nm thick film with a slight shift in the absorption edge. |
| Keywords: | 81.05.Je 72.80.Tm 78.66.Sq |
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