The study of ion mixed amorphous carbon films on single crystal silicon by C ion implantation |
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Authors: | Rong Sun Tao Xu Qun-ji Xue |
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Institution: | a State Key Laboratory of Solid Lubrications, Lanzou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, PR China b Laboratory for Special Functional Materials, Henan University, Kaifeng 475001, PR China c Graduate School, Chinese Academy of Sciences, Beijing 100039, PR China |
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Abstract: | Amorphous-carbon (a-C) films were deposited on a single-crystal silicon substrate by vacuum vapor deposition system and these amorphous carbon films were implanted with 110 keV C+ at fluences of 1 × 1017 ions/cm2. The effect of ion mixing on the surface morphology, friction behavior and adhesion strengths of amorphous carbon films was examined making use of atomic force microscopy (AFM), ball-on-disk reciprocating friction tester, nano-indentation system and scanning electron microscope (SEM). The changes in chemical composition and structure were investigated by using X-ray photoelectron spectroscopy (XPS). The results show that the anti-wear life and adhesion of amorphous carbon films on the Si substrates were significantly increased by C ion implantation. The SiC chemical bonding across the interface plays a key role in the increase of adhesion strength and the anti-wear life of amorphous carbon film. The friction and wear mechanisms of amorphous carbon film under dry friction condition were also discussed. |
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Keywords: | Amorphous carbon film C+ implantation Single-crystal silicon Friction and wear |
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