Effect of end groups on contact resistance of alkanethiol based metal-molecule-metal junctions using current sensing AFM |
| |
Authors: | N Gosvami KHA Lau SJ O'Shea |
| |
Institution: | a Department of Mechanical Engineering, National University of Singapore, 9 Engineering Drive 1, Singapore 117576, Singapore b Institute of Material Research and Engineering, 3 Research Link, Singapore 117602, Singapore |
| |
Abstract: | Tuning the charge transport through a metal-molecule-metal junction by changing the interface properties is widely studied and is of paramount importance for applications in molecular electronic devices. We used current sensing atomic force microscopy (CSAFM) as a tool to study the contact resistance of metal-molecule-metal (MmM) junctions formed by sandwiching self-assembled monolayers (SAMs) of alkanethiols with various end groups (-CH3, -OH and -NH2) between Au(1 1 1) substrates and Au coated AFM tips. The effect of interface chemistry on charge transport through such SAMs with varying end groups was studied in an inert, non-polar liquid (hexadecane) environment. We find that the contact resistances of these MmM junctions vary significantly based on the end group chemistry of the molecules. |
| |
Keywords: | Metal-molecule-metal junctions Self-assembled monolayer Current sensing atomic force microscopy |
本文献已被 ScienceDirect 等数据库收录! |