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Selective ablation of thin films with short and ultrashort laser pulses
Authors:J Hermann  M Benfarah  S Bruneau  J-F Guillemoles  P Alloncle
Institution:a LP3 UMR 6182 CNRS - Université Aix-Marseille II, Faculté des Sciences de Luminy, Case 917, F-13288 Marseille Cedex 9, France
b IRDEP, Projet CISEL, EDF R&D, 6 quai Watier, F-78400 Chatou, France
c NILPRP-Laser Department, P.O. Box MG-36, RO-77125, Romania
Abstract:Micromachining of CuInSe2 (CIS)-based photovoltaic devices with short and ultrashort laser pulses has been investigated. Therefore, ablation thresholds and ablation rates of ZnO, Mo and CuInSe2 thin films have been measured for irradiation with nanosecond laser pulses of ultraviolet and visible light and subpicosecond laser pulses of a Ti:sapphire laser. The experimental results were compared to the theoretical evaluation of the samples heat regime. In addition, the cells photo-electrical properties were measured before and after laser machining. Scanning electron microscopy (SEM) and energy dispersive X-ray (EDX) analyses were employed to characterise the laser-induced ablation channels. Using nanosecond laser pulses, two phenomena were found to limit the laser-machining process. Residues of Mo that were projected onto the walls of the ablation channel and the metallization of the CuInSe2 semiconductor close to the channel lead to a shunt. The latter causes the decrease of the photovoltaic efficiency. As a consequence of these limiting effects, only subpicosecond laser pulses allowed the selective or complete ablation of the thin layers without a relevant change of the photo-electrical properties.
Keywords:79  20  D  81  20  W  84  60  J
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