Femtosecond laser-induced damage in reflector |
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Authors: | Haiyi Sun Tianqing Jia Xiaoxi Li Donghai Feng Xiaochun Ge |
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Affiliation: | a State Key Laboratory of High Field Laser Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, P.O. Box 800-211, Shanghai 201800, PR China b The Institute for Solid State Physics, University of Tokyo, 5-1-5 Kashiwanoha, Kashiwa, Chiba 277-8581, Japan |
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Abstract: | We have investigated the damage for ZrO2/SiO2 800 nm 45° high-reflection mirror with femtosecond pulses. The damage morphologies and the evolution of ablation crater depths with laser fluences are dramatically different from that with pulse longer than a few tens of picoseconds. The ablation in multilayers occurs layer by layer, and not continuously as in the case of bulk single crystalline or amorphous materials. The weak point in damage is the interface between two layers. We also report its single-short damage thresholds for pulse durations ranging from 50 to 900 fs, which departs from the diffusion-dominated scaling. A developed avalanche model, including the production of conduction band electrons (CBE) and laser energy deposition, is applied to study the damage mechanisms. The theoretical results agree well with our measurements. |
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Keywords: | 45° high-reflection mirror Femtosecond laser Damage threshold Ablation depth |
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