PLD of Fe3O4 thin films: Influence of background gas on surface morphology and magnetic properties |
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Authors: | ML Paramês J Mariano Z Viskadourakis N Popovici MS Rogalski J Giapintzakis O Conde |
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Institution: | a Department of Physics, Faculty of Sciences, University of Lisboa, 1749-016 Lisboa, Portugal b Faculty of Sciences and Technology, University of Algarve, 8000-117 Faro, Portugal c Institute of Electronic Structure and Laser, FORTH, 71110 Heraklion, Crete, Greece d Department of Physics, Instituto Superior Técnico, 2780-990 Taguspark Oeiras, Portugal e Institute of Materials and Surface Science and Engineering, 1749-001 Lisboa, Portugal f Department of Materials Science and Technology, University of Crete, 71003 Heraklion, Crete, Greece g Department of Physics, University of Cyprus, 1678 Nicosia, Cyprus |
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Abstract: | Ablation of Fe3O4 targets has been performed using a pulsed UV laser (KrF, λ = 248 nm, 30 ns pulse duration) onto Si(100) substrates, in reactive atmospheres of O2 and/or Ar, with different oxygen partial pressures. The as-deposited films were characterised by atomic force microscopy (AFM), X-ray diffraction (XRD), conversion electron Mössbauer spectroscopy (CEMS) and extraction magnetometry, in order to optimise the deposition conditions in the low temperature range. The results show that a background mixture of oxygen and argon improves the Fe:O ratio in the films as long as the oxygen partial pressure is maintained in the 10−2 Pa range. Thin films of almost stoichiometric single phase polycrystalline magnetite, Fe2.99O4, have been obtained at 483 K and working pressure of 7.8 × 10−2 Pa, with a high-field magnetization of ∼490 emu/cm3 and Verwey transition temperature of 112 K, close to the values reported in the literature for bulk magnetite. |
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Keywords: | 81 15 Fg 76 80 +y 75 50 Gg 75 70 Ak |
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