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Swift ion irradiations of Fe/Fe/Si trilayers
Authors:V Milinovic  PK Sahoo  K Zhang  M Weisheit
Institution:a II. Physikalisches Institut and SFB 602, Universität Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen, Germany
b Hahn-Meitner-Institut, Glienicker Str. 100, 14109 Berlin, Germany
c IFW Dresden, Helmoltzstr. 20, 01069 Dresden, Germany
Abstract:We report here on changes in magnetism and microstructure when implanting, at 92 or 300 K, up to 5 × 1015 Au26+-ions cm−2 of 350 MeV into natFe(45 nm)/57Fe(20 nm)/Si trilayers. This choice of ions and energy allowed to test the irradiation effects in the regime of pure electronic stopping. The samples were analysed before and after irradiation by Rutherford back-scattering spectroscopy, X-ray diffraction, conversion electron Mössbauer spectroscopy, and magneto-optical Kerr effect. Up to 1 × 1015 ions cm−2, there was interface broadening at a mixing rate of Δσ2/Φ = 55(5) nm4, followed by full Fe-Si inter-diffusion. The Mössbauer spectra revealed fractions of α-Fe and amorphous ferromagnetic and paramagnetic iron silicides, but no crystalline Fe-Si phase. The magnetic remanence in the as-deposited Fe-layer showed small components of uniaxial and four-fold magnetization. For increasing ion fluence, the component with four-fold symmetry grew at the expense of the uniaxial component. For the highest fluences, an isotropic magnetization was found.
Keywords:61  80  Jh  68  35  Ct  75  70  Cn  76  80  +y
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