Effect of Al content on the properties of Cr1−xAlxC films prepared by RF reactive magnetron sputtering |
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Authors: | Tsow-Chang Fu |
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Affiliation: | Institute of Engineering Science and Technology, National Kaohsiung First University of Science and Technology, Taiwan |
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Abstract: | Cr1−xAlxC films were deposited on high-speed steel by RF reactive magnetron sputtering. In this study, we aimed to identify the effect of the Al content on the properties of Cr1−xAlxC films. We found that Cr1−xAlxC films exhibited a fine columnar grain microstructure with some special characteristics, such as high hardness of Hv 1426, a low friction coefficient of 0.29, and a large contact angle of 90° for x = 0.18. Furthermore, an increase in Al content resulted in a decrease in film hardness and an increase in contact angle. Moreover, on annealing at 923 K, the mechanical properties of the films improved and a dense protective film of complex Cr2O3 and Al2O3 oxides was formed on the surface for better wear resistance, which will ultimately increase the lifetime of the high-speed steel substrate. |
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Keywords: | 81.15.Cd 81.15.-z 62.20.-x 68.35.Md |
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