Cobalt and tantalum additions for enhanced electrochromic performances of nickel-based oxide thin films grown by pulsed laser deposition |
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Authors: | Yoshinari Makimura Jean-Marie Tarascon |
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Affiliation: | Laboratoire de Réactivité et de Chimie des Solides, CNRS UMR-6007, Université de Picardie Jules Verne, 33 rue Saint Leu, 80039 Amiens Cedex, France |
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Abstract: | Aiming at improving the durability of anodic electrochromic nickel oxide thin films, Ni-M-O (M = Co, Ta) thin films were grown by pulsed laser deposition (PLD), using optimized conditions, namely room temperature and 10−1 mbar oxygen pressure. For low Co and Ta contents (<5%), both additions lead to a loss of the [1 1 1] preferred orientation of the NiO rock-salt structure followed by a film amorphization with increasing Ta amount. Among the two series of metal additions (M ≤ 20%), the Ni-Co-O (5% Co) and Ni-Ta-O (10% Ta) thin films show the highest electrochemical performances especially in respect of improved durability. If the enhanced properties are associated with a limited dissolution of the oxidized phase for the Ni-Ta-O system, the opposite trend is observed for the Ni-Co-O system as compared to pure NiO. |
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Keywords: | Nickel oxide Ni-Co-O thin films Ni-Ta-O thin films Pulsed laser deposition Electrochromism |
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