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Fabrication of Al nanoparticles and their electrical properties studied by capacitance-voltage measurements
Authors:T Noda  T Mano  N Koguchi
Institution:Nanomaterials Laboratory, National Institute for Materials Science, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0003, Japan
Abstract:Nanometer-scale Al particles are fabricated and are embedded in a GaAs matrix using molecular beam epitaxial technique. The Al particle is self-assembled on GaAs by supplying an Al molecular beam. The average particle size is found to be 25 nm. The density is 7 × 1010 cm−2 when Al of 6.2 × 1015 atoms/cm2 is supplied on (1 0 0)GaAs at a substrate temperature of 300 °C. Clear hysteresis and plateaus in capacitance-voltage (C-V) curves are found in an Al-embedded sample, whereas monotonic increase of capacitance is obtained in a reference sample having an AlAs layer instead of Al. This difference results from trapping of electrons by the Al particles, suggesting that the particles have metallic character.
Keywords:73  22  -f  73  63  -b
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