Femtosecond laser induced defects in various silica glasses |
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作者姓名: | 周秦岭 刘丽英 徐雷 王文澄 邱建荣 朱从善 干福熹 |
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作者单位: | Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,Shanghai 201800 State Key Lab for Advanced Photonic Materials and Devices,Department of Optical Science and Engineering,Fudan University,Shanghai 200433,State Key Lab for Advanced Photonic Materials and Devices,Department of Optical Science and Engineering,Fudan University,Shanghai 200433,State Key Lab for Advanced Photonic Materials and Devices,Department of Optical Science and Engineering,Fudan University,Shanghai 200433,State Key Lab for Advanced Photonic Materials and Devices,Department of Optical Science and Engineering,Fudan University,Shanghai 200433,Photon Craft Project,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,Shanghai 201800,Photon Craft Project,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,Shanghai 201800,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,Shanghai 201800 State Key Lab for Advanced Photonic Materials and Devices,Department of Optical Science and Engineering,Fudan University,Shanghai 200433 |
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基金项目: | This work was supported by the National Natural Science Foundation of China (No. 10074011),the Ministry of Science and Technology of China (No. 2001CCA04600). |
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摘 要: | The mechanism of near infrared (IR) focused femtosecond (fs) laser induced defects in silica glasses produced by different methods is systematically investigated through measurements of absorption, fluorescence, and electronic spin resonance (ESR) spectra. The influence of impurities and hydroxyl groups on defects is discussed. The results show that ES silica glasses containing high OH and few defects are much stable under fs laser irradiation. It is also verified that Si E_δ~′center formation has no direct relation with chloride ions.
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