Synthesis of graft copolymers by combination of radical photopolymerization and iniferter process

Various PS‐based graft copolymers including polystyrene‐graft‐poly(methyl methacrylate) and poly(styrene‐graft‐poly(ethylene glycol) methacrylate) are prepared via subsequent visible light radical photopolymerization and iniferter processes. Thus, poly(styrene‐co‐4‐chloromethylstyrene) P(S‐co‐VBC) is synthesized by light induced free‐radical polymerization. Then, chloride moieties are substituted with triphenylmethyl (trityl) groups to give trityl‐substituted PS (PS‐trityl) under visible light irradiation using dimanganese decacarbonyl (Mn₂(CO)₁₀) photochemistry. Side chains are then grafted from PS‐trityl backbone via iniferter process to give desired graft copolymers in a controlled manner. The precursor intermediates and the final graft copolymers are analyzed by ¹H NMR, FT‐IR, and GPC measurements. © 2019 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2019, 57, 1344–1348