Reactive Deposition of Al 2 O 3 Coatings by Thermal Evaporation in a High-Current Discharge with a Hollow Anode

The conditions of Al2O3-coating deposition in a high-current discharge with an evaporating crucible anode and an additional hollow ionization-system anode are investigated. Using probe diagnostics and optical spectroscopy, it is determined that an additional hollow anode provides an increase in the ion-current density on the surface of the coatings by ~2 times and an increase in the atomic-oxygen concentration by 1.6–2.6 times. The nanocrystalline Al2O3 coatings are deposited by the method of reactive anodic evaporation and the range of operating parameters is determined within which the α-Al2O3 phase is synthesized at a temperature of 600°C.