Synthesis of GaN nanocrystallites by pulsed laser ablation in pure nitrogen background gases

GaN is a promising material not only for electronic devices but also for photocatalysts. Synthesis of GaN nanocrystal is a key issue to improve performance for these applications. In the present study, GaN nanocrystallites have been synthesized by pulsed laser ablation (PLA), where safe and inactive pure N₂ gases were used as reactive background gases. The third harmonics beam of a Q-switched Nd:YAG laser (355 nm, 10 mJ/pulse, 4 J/(cm² pulse)) was used to ablate a sintered high purity GaN target. The deposition substrates were not heated. It was clarified that the formed GaN nanoparticles contained a hexagonal system with the wurtzite structure. The diameter of the nanocrystallites was about 10 nm, and showed only little dependence on the background gas pressure, while the porosity of the assembly of nanocrystallites and content of GaN nanocrystallites in the assembly increased with background gas pressure. Highly porous nanometer-sized GaN film obtained at higher gas pressure is considered to be candidate structures for the photocatalysts.