Interferometric optical isolator with Si guiding layer fabricated by wafer bonding |
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Authors: | Hideki Yokoi |
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Institution: | a Department of Electronic Engineering, Shibaura Institute of Technology, 3-7-5 Toyosu, Koto-ku, Tokyo 135-8548, Japan |
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Abstract: | An interferometric optical isolator, with a Si guiding layer, employing a nonreciprocal phase shift was studied. The optical isolator was comprised of a magneto-optic waveguide with a magnetic garnet/Si/SiO2 structure, which was fabricated by wafer bonding technique. The nonreciprocal phase shift in the magneto-optic waveguide with the Si guiding layer was calculated at a wavelength of 1.55 μm. Several kinds of layer structures in the magneto-optic waveguide were discussed. |
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