Nd photoluminescence study of Nd-doped Si-rich silica films obtained by reactive magnetron sputtering

Nd³⁺-doped silicon-rich silicon oxide (SRSO) thin films have been fabricated by reactive magnetron sputtering of a pure silica target topped with Nd₂O₃ chips. The concentration of Nd ions in the deposited layers is controlled by the number of Nd₂O₃ chips, whereas the incorporation of silicon excess is monitored by the hydrogen partial pressure, P_H2, introduced in the Ar plasma, owing to the ability of hydrogen to reduce the oxygen released by the sputtering of the silica target. Photoluminescence (PL) experiments were made at room temperature using a nonresonant excitation line from an Ar laser. The influences of Nd³⁺ content and P_H2 have been studied to optimize the Nd³⁺ emission. PL spectra reveal a two order of magnitude enhancement of the Nd³⁺ emission around both 0.9 and 1.1 μm, when Si nanoclusters (Si-nc) are formed in the same Nd³⁺-doped matrix. The dependence of the Nd³⁺ PL with P_H2 and Nd concentration is indicative of the occurrence of an efficient energy transfer from the Si-nc to the rare earth ions. The radiative lifetime is also deduced and commented in the light of Nd³⁺-Si-nc coupling.