Microelectrode patterning of metal films using pulsed UV-laser system

This study presents a maskless method to conduct microelectrode patterning of metal films using pulsed UV-laser-writing technology. The experimental procedures involved designing the ablation region of a glass substrate, ablation path planning, and determining detailed laser-writing parameters. The various parameters used in a UV-laser-writing system were investigated and analyzed using an optical microscope and a three-dimensional confocal laser scanning microscope. This technique was successfully applied in patterning aluminum (Al) thin film on a glass substrate for use in microheater devices. The measurements of electrical resistance and temperature distribution on the substrate demonstrated that no short circuiting occurred in the microheater, confirming the quality of the electrical isolation values.