Accurate extraction of trap depth responsible for RTS noise in nano-MOSFETs |
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Authors: | Ma Zhong-F Zhang Peng Wu Yong Li Wei-Hu Zhuang Yi-Qi and Du Lei |
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Institution: | School of Microelectronics, Xidian University, Xi'an 710071, China |
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Abstract: | This paper presents an accurate analytical model of the random telegraph signal (RTS) noise time-constant ratio (\bar {τ}c/ \bar {τ}e for RTS noise in nano-MOSFETs, in which the Coulomb-blockade effect on trapping and detrapping processes was taken into account. Based on this new model, the depth of the trap responsible for RTS noise in a sample n-type nano-MOSFET is extracted. The results show that large errors will be introduced to the calculated trap depth when the Coulomb-blockade effect is neglected. |
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Keywords: | trap RTS noise nano-MOSFETs |
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