A new generation optical lithography using a third harmonic pulse generated by micro-ring resonators |
| |
Authors: | P.P. Yupapin S. Chaiyasoonthorn O. Saneujit |
| |
Affiliation: | Advanced Research Center for Photonics, Department of Applied Physics, Faculty of Science, King Mongkut's Institute of Technology, Ladkrabang, Bangkok 10520, Thailand |
| |
Abstract: | We first propose a new system of a third harmonic generation by using a soliton pulse circulating in the integrated micro-ring devices. By using this system, the ultra-short pulse in the attosecond (as) and beyond can be easily generated. In principle, light pulse known as a soliton pulse is input into a design system. It consist the three-stage micro-ring resonators, where the ring radii are within the range between 5 and 35 μm. With the appropriate parameters such as ring radius, coupling ratio and nonlinear refractive index, the attosecond pulse is generated by filtering the chaotic signals within the micro-ring devices. One of the results obtained has shown that the generation of the ultra narrow pulse (spectral width) and sharp tip is achieved. The potential of using such a pulse for picometer (pm)-scale lithography is plausible. |
| |
Keywords: | New generation lithography High-resolution lithography Nonlinear micro-ring resonator |
本文献已被 ScienceDirect 等数据库收录! |
|