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Application of X-ray fluorescence holography to the analysis of the interior and surface of an yttrium oxide thin film |
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| Authors: | Jens R Stellhorn Shinya Hosokawa Naohisa Happo Hiroo Tajiri Tomohiro Matsushita Kenichi Kaminaga Tomoteru Fukumura Tetsuya Hasegawa Koji Kimura Kouichi Hayashi |
| Institution: | 1. Department of Physics, Kumamoto University, Kumamoto, Japan;2. Graduate School of Information Sciences, Hiroshima City University, Hiroshima, Japan;3. Japan Synchrotron Radiation Research Institute (JASRI), Hyogo, Japan;4. Department of Chemistry, The University of Tokyo, Tokyo, Japan
Department of Chemistry, Tohoku University, Sendai, Japan;5. Department of Chemistry, Tohoku University, Sendai, Japan WPI Advanced Institute for Materials Research, Tohoku University, Sendai, Japan;6. Department of Chemistry, The University of Tokyo, Tokyo, Japan;7. Department of Physical Science and Engineering, Nagoya Institute of Technology, Nagoya, Japan;8. Department of Physical Science and Engineering, Nagoya Institute of Technology, Nagoya, Japan Frontier Research Institute for Materials Science, Nagoya Institute of Technology, Nagoya, Japan |
| Abstract: | We report on the characterization of a thin film of yttrium oxide by X-ray fluorescence holography. The sample has a layered structure with an YO base layer and an oxidized Y2O3 surface. Both layers are clearly observed in the atomic image reconstructions, and their local structure is analyzed. We show that by using incident energies close to the absorption edge of the fluorescing atom, it becomes possible to observe the thin surface layer clearly, even next to a base layer containing the same fluorescing element. |
| Keywords: | thin-film analysis X-ray fluorescence holography yttrium oxide |