TFT-LCD阵列穿透率提升的研究

提高薄膜晶体管液晶显示器阵列基板的光利用效率的主要方法是提高开口率和穿透率。文章制作了低温多晶硅阵列穿透区多层膜,考察膜层以及结构对穿透率的影响,研究阵列光线穿透率提升的方法。结果表明,层间介质层（ILD）完成后不同折射率膜层接口对穿透率影响较大,平坦层（PL）的厚度对穿透率没有明显影响,导电膜氧化铟锡（ITO）厚度增加,穿透率下降。通过在阵列穿透区减少膜层数量和改变膜层组分,减少折射率差异较大的界面,可增加穿透率7%左右。

Study on Array Transmittance Improvement of TFT-LCD

Aperture ratio and transmittance increasement were the main methods to improve light efficiency of TFT-LCD array substrate.Multilayer thin films of low temperature poly-Si array transmission area was made,the effect of thin films and structure on transmittance was discussed,how to enhance light transmittance was studied in the paper.The results show that transmittance was greatly affected by different refractive index surface after inter layer dielectrics finished,the effect of planarization layer thickness on transmittance was not obvious,transmittance was decreased with ITO thickness increased.By decreasing the film numbers,changing the film component,the inter surface with great difference of refractive index was reduced and transmittance can be improved by 7% approximately.