Investigation of multilayer X‐ray optics for the 6 keV to 20 keV energy range |
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Authors: | P Oberta Y Platonov U Flechsig |
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Abstract: | The X‐ray optics group at the Swiss Light Source in co‐operation with RIT (Rigaku Innovative Technologies) have investigated seven different multilayer samples. The goal was to find an ideal multilayer structure for the energy range between 6 keV and 20 keV in terms of energy resolution and reflectivity. Such multilayer structures deposited on substrates can be used as X‐ray monochromators or reflecting synchrotron mirrors. The measured reflectivities agree with the simulated ones. They cover a reflectivity range from 45% to 80% for energies between 6 keV and 10 keV, and 80% to 90% for energies between 10 keV and 20 keV. The experimentally measured energy resolution of the samples lies between 0.3% and 3.5%. |
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Keywords: | X‐ray optics multilayer energy resolution |
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