| Abstract: | X‐ray optics called multilayer Laue lenses (MLLs) provide a promising path to focusing hard X‐rays with high focusing efficiency at a resolution between 5 nm and 20 nm. MLLs consist of thousands of depth‐graded thin layers. The thickness of each layer obeys the linear zone plate law. X‐ray beamline tests have been performed on magnetron sputter‐deposited WSi2/Si MLLs at the Advanced Photon Source/Center for Nanoscale Materials 26‐ID nanoprobe beamline. However, it is still very challenging to accurately grow each layer at the designed thickness during deposition; errors introduced during thickness measurements of thousands of layers lead to inaccurate MLL structures. Here, a new metrology approach that can accurately measure thickness by introducing regular marks on the cross section of thousands of layers using a focused ion beam is reported. This new measurement method is compared with a previous method. More accurate results are obtained using the new measurement approach. |
