| 微束斑X射线源聚焦系统的数值研究 |
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| 引用本文： | 王凯歌,牛憨笨,郭金川.微束斑X射线源聚焦系统的数值研究[J].光子学报,1999,28(12):1141-1145. |
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| 作者姓名： | 王凯歌 牛憨笨 郭金川 |
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| 作者单位： | 中国科学院西安光学精密机械研究所,光电子部,710068 |
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| 摘 要： | 本文研究了由两个磁透镜组成的电子束打靶微束斑X射线源的聚焦系统.首先利用有限元法计算了磁透镜的磁感应强度的轴上分布,在此基础上用三次样条函数插值计算了磁场的空间分布,最后用四阶Runge-Kutta法追踪了电子的运动轨迹,并给出了入射电子束经过聚焦系统后的缩小倍率.
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| 关 键 词： | 微束斑X射线源 聚焦系统 数值模拟 |
| 收稿时间： | 1999-07-30 |
| 修稿时间： | 1999-07-30 |
FOCUSING SYSTEM IN X-RAY SOURCE WITH MICRO-BEAM |
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| Wang Kaigek,Niu Hanben,Guo Jinchuan.FOCUSING SYSTEM IN X-RAY SOURCE WITH MICRO-BEAM[J].Acta Photonica Sinica,1999,28(12):1141-1145. |
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| Authors: | Wang Kaigek Niu Hanben Guo Jinchuan |
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| Institution: | Xi′an Institute of Optics & Precision Mechanics, Academia Sinica, Xi′an 710068 |
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| Abstract: | The focusing system which is consist of two magnetic lens in X ray source with micro beam has been studied in this paper.Finite element method (FEM) was used to calculate the axial magnetic field and cubic spline interpolation was used to calculate the spatial magnetic field.Furthermore,the electron trajectory was traced by Runge Kutta method.The finial size of electron beam image was suited for micro beam X ray source. |
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| Keywords: | X ray source with micro beam Focusing system Numerical simulation |
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