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Quantitative surface analysis by Auger and x-ray photoelectron spectroscopy
Authors:I.S. Tilinin  A. Jablonski  W.S.M. Werner
Affiliation:

* Institute of Physical Chemistry, Polish Academy of Sciences, ul. Kasprzaka 44/52, 01-224, Warsaw, Poland

** Institute for Applied and Technical Physics, Vienna University of Technology, Wiedner Hauptstrasse, 8-10, Vienna A-1040, Austria

Abstract:Recent developments in quantitative surface analysis by Auger (AES) and x-ray photoelectron (XPS) spectroscopies are reviewed and problems relating to a more accurate quantitative interpretation of AES/XPS experimental data are discussed. Special attention is paid to consideration of elementary physical processes involved and influence of multiple scattering effects on signal line intensities. In particular, the major features of core-shell ionization by electron impact, Auger transitions and photoionization are considered qualitatively and rigorous approaches used to calculate the respective transition probabilities are analysed. It is shown that, in amorphous and polycrystalline targets, incoherent scattering of primary and signal Auger and photoelectrons can be described by solving analytically a kinetic equation with appropriate boundary conditions. The analytical results for the angular and energy distribution, the mean escape depth, and the escape probability as a function of depth of origin of signal electrons as well as that for the backscattering factor in AES are in good agreement with the corresponding Mote Carlo simulation data. Methods for inelastic background subtraction, surface composition determination and depth-profile reconstructions by angle-resolved AES/XPS are discussed. Examples of novel techniques based on x-ray induced photoemission are considered.
Keywords:Abbreviations: AED, Auger electron diffraction   AES, Auger electron spectroscopy   AL, attenuation length   APECS, Auger photoelectron coincidence spectroscopy   ARAES, angle-resolved Auger electron spectroscopy   ARXPS, angle-resolved x-ray photoelectron spectroscopy   CMA, cylindrical mirror analyser   CWBA, Coulomb-wave Born approximation   DDF, depth distribution function   DWBA, distorted-wave Born approximation   EPMA, electron probe microanalysis   FWHM, full width at half maximum   IMFP, inelastic mean free path   LEED, low-energy electron diffraction   MAXIMUM, multiple-application x-ray imaging undulator microscope   MC, Monte Carlo   PWBA, plane-wave Born approximation   QUEST, quantitation of electron spectroscopy techniques   REELS, reflection electron energy-loss spectroscopy   SEXAFS, surface extended x-ray absorption fine structure   SIMS, secondary-ion mass spectroscopy   SLA, straight-line approximation   SPEM, scanning photoelectron microscope   TA, transport approximation   XPS, x-ray photoelectron spectroscopy   XSW, x-ray standing wave
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