Quantitative surface analysis by Auger and x-ray photoelectron spectroscopy |
| |
Authors: | I.S. Tilinin A. Jablonski W.S.M. Werner |
| |
Affiliation: | * Institute of Physical Chemistry, Polish Academy of Sciences, ul. Kasprzaka 44/52, 01-224, Warsaw, Poland ** Institute for Applied and Technical Physics, Vienna University of Technology, Wiedner Hauptstrasse, 8-10, Vienna A-1040, Austria |
| |
Abstract: | Recent developments in quantitative surface analysis by Auger (AES) and x-ray photoelectron (XPS) spectroscopies are reviewed and problems relating to a more accurate quantitative interpretation of AES/XPS experimental data are discussed. Special attention is paid to consideration of elementary physical processes involved and influence of multiple scattering effects on signal line intensities. In particular, the major features of core-shell ionization by electron impact, Auger transitions and photoionization are considered qualitatively and rigorous approaches used to calculate the respective transition probabilities are analysed. It is shown that, in amorphous and polycrystalline targets, incoherent scattering of primary and signal Auger and photoelectrons can be described by solving analytically a kinetic equation with appropriate boundary conditions. The analytical results for the angular and energy distribution, the mean escape depth, and the escape probability as a function of depth of origin of signal electrons as well as that for the backscattering factor in AES are in good agreement with the corresponding Mote Carlo simulation data. Methods for inelastic background subtraction, surface composition determination and depth-profile reconstructions by angle-resolved AES/XPS are discussed. Examples of novel techniques based on x-ray induced photoemission are considered. |
| |
Keywords: | Abbreviations: AED, Auger electron diffraction AES, Auger electron spectroscopy AL, attenuation length APECS, Auger photoelectron coincidence spectroscopy ARAES, angle-resolved Auger electron spectroscopy ARXPS, angle-resolved x-ray photoelectron spectroscopy CMA, cylindrical mirror analyser CWBA, Coulomb-wave Born approximation DDF, depth distribution function DWBA, distorted-wave Born approximation EPMA, electron probe microanalysis FWHM, full width at half maximum IMFP, inelastic mean free path LEED, low-energy electron diffraction MAXIMUM, multiple-application x-ray imaging undulator microscope MC, Monte Carlo PWBA, plane-wave Born approximation QUEST, quantitation of electron spectroscopy techniques REELS, reflection electron energy-loss spectroscopy SEXAFS, surface extended x-ray absorption fine structure SIMS, secondary-ion mass spectroscopy SLA, straight-line approximation SPEM, scanning photoelectron microscope TA, transport approximation XPS, x-ray photoelectron spectroscopy XSW, x-ray standing wave |
本文献已被 ScienceDirect 等数据库收录! |
|