Elastic modulus-density relationship for amorphous boron suboxide thin films |
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Authors: | D Music U Kreissig Zs Czigány U Helmersson JM Schneider |
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Institution: | Department of Physics, Link?ping University, 58183 Link?ping, Sweden, SE Forschungszentrum Rossendorf e.V., Institut für Ionenstrahlphysik und Materialforschung, PF 510119, 01314 Dresden, Germany, DE
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Abstract: | Boron suboxide thin films have been deposited on Si(100) substrates by reactive RF magnetron sputtering of a sintered B target
in an Ar/O2 atmosphere. Elastic recoil detection analysis was applied to determine the film composition and density. Film structure was
studied by X-ray diffraction and transmission electron microscopy. The elastic modulus, measured by nanoindentation, was found
to decrease as the film density decreased. The relationship was affected by tuning the negative substrate bias potential and
the substrate temperature during film growth. A decrease in film density, by a factor of 1.55, caused an elastic modulus reduction
by a factor of 4.5, most likely due to formation of nano-pores containing Ar. It appears evident that the large scattering
in the published data on elastic properties of films with identical chemical composition can readily be understood by density
variations. These results are important for understanding the elastic properties of boron suboxide, but may also be qualitatively
relevant for other B-based material systems.
Received: 22 February 2002 / Accepted: 11 April 2002 / Published online: 10 September 2002
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ID="*"Corresponding author. Fax: +46-13/288-918, E-mail: denmu@ifm.liu.se |
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Keywords: | PACS: 68 60 Bs 62 20 Dc 68 60 Wm |
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