Characteristics of photopolymer holographic matched filters in a van der Lugt correlator

Parameters of van der Lugt holographic matched filters for phase and amplitude transparencies, including random phase masks, are studied. Conditions for recording such filters in a phase self-developing photopolymer are determined. A significant difference in the recording conditions for the holographic filters for amplitude transparencies and phase masks is demonstrated. The holographic filters for phase masks with a signal-to-noise ratio of 20–40 dB and η from 6 to 70% that are recorded in the photopolymerizable composition seem to be promising for optical pattern recognition.