X-ray determination of thermal lattice expansion of CuSi2 + xP3 (x = 1, 2) at elevated temperatures

CuSi₂P₃ is a semiconductor having sphalerite structure with the space group F3 3m with random distribution of the copper and silicon atoms on the cation sites. Silicon is soluble in CuSi₂P₃ upto 3 moles to form CuSi_{2 + x}P₃ (x = 1, 2, 3) compounds in single phase. In continuation of our work on thermal expansion of ternary semiconductors, CuSi₃P₃ crystals have been grown by a modified Bridgman method. Using a Unicam high temperature camera, the precision lattice parameter and the coefficient of thermal expansion (CTE) of CuSi₃P₃ at various high temperatures have been evaluated from X-ray diffraction data. It has been found that the lattice parameter increases non-linearly while the coefficient of thermal expansion increases linearly with temperature. The results on thermal expansion of various semiconductors have been discussed in terms of their ionicities.