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Hyperdoping of Si by ion implantation and pulsed laser melting
Institution:1. Department of Electronic Materials Engineering, Research School of Physics and Engineering, Australian National University, Canberra 2601, ACT, Australia;2. Department of Physics, University of Dayton, 300 College Park, Dayton, OH 45469, USA;1. Interuniversity Microelectronics Center, Kapeldreef 75 B-3001, Leuven, Belgium;2. Applied Materials, Gloucester, MA 01930, USA;3. Applied Materials, Kapeldreef 75, B-3001 Leuven, Belgium;1. Istituto per la Microelettronica e Microsistemi (CNR-IMM), VIII Strada 5, 95121 Catania, Italy;2. Dipartimento di Fisica e Astronomia, Università di Catania, Via Santa Sofia 64, 95125 Catania, Italy;3. LAAS, CNRS and University of Toulouse, 7 av. Du Col. Roche, 31400 Toulouse, France;4. University of Basel University of Basel, Klingelbergstrasse 82, CH-4056 Basel, Switzerland;5. Istituto per la Microelettronica e Microsistemi (CNR-IMM), Via S. Sofia 64, 95123 Catania, Italy;6. CNR-IMM MATIS and Dipartimento di Fisica Astronomia, Università di Padova, Via Marzolo 8, 35131 Padova, Italy;1. LAAS-CNRS, Université de Toulouse, UPS, 31031 Toulouse, France;2. Laser Systems & Solutions of Europe (LASSE), 145 rue des Caboeufs, 92230 Gennevilliers, France;3. CEA-LETI, 17 rue des Martyrs, 38054 Grenoble, France;4. IMM-CNR, Zona industriale, Strada VIII 5, 95121 Catania, Italy;1. Dipartimento di Fisica e Astronomia, Università degli Studi di Padova, Via Marzolo 8, 35131 Padova, Italy;2. Istituto Nazionale di Fisica Nucleare, Laboratori Nazionali di Legnaro, Viale dell’Università 2, 35020 Legnaro, PD, Italy;3. Dipartimento di Fisica, Sapienza Università di Roma, Piazzale Aldo Moro 5, I-00185 Roma, Italy;1. State Key Laboratory of Environment-friendly Energy Materials, School of Mathematics and Physics, Southwest University of Science and Technology, Mianyang 621010, China;2. Songshan Lake Materials Laboratory, Dongguan 523808, China
Abstract:Ion implantation followed by pulsed laser melting is an extensively-studied method for hyperdoping Si with impurity concentrations that exceed the equilibrium solubility limit by orders of magnitude. In the last decade, hyperdoped Si has attracted renewed interest for its potential as an intermediate band material. In this review, we first examine the important experimental results on both solid and liquid phase crystal regrowth from early laser annealing studies. The highly non-equilibrium regrowth kinetics following pulsed laser melting and its implications for dopant incorporation processes are discussed. We then review recent work in hyperdoped Si for enhanced sub-band gap photoresponse and give a brief discussion on photodetector device performance.
Keywords:Ion implantation  Pulsed laser melting  Hyperdoped silicon  Intermediate band silicon  IR photodetectors  Laser annealing
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