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Growth of ultrathin films of amorphous ruthenium-phosphorus alloys using a single source CVD precursor |
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| Authors: | Shin Jinhong Waheed Abdul Agapiou Kyriacos Winkenwerder Wyatt A Kim Hyun-Wu Jones Richard A Hwang Gyeong S Ekerdt John G |
| Affiliation: | Texas Materials Institute, University of Texas at Austin, Austin, TX 78750, USA. |
| Abstract: | Thin films ( approximately 30 nm) of amorphous RuP alloys (P approximately 15-20%) can be grown by CVD from the single source precursor cis-H2Ru(PMe3)4 at 250-300 degrees C and 200 mTorr pressure on native SiO2. |
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