Design and synthesis of highly photopolymerizable styrenyl compounds in solid‐state photoinitiated polymerization

We designed a new type of styrenyl compound applicable to conventional photopolymerization systems, aiming at the production of polymers with improved mechanical properties, resistance to chemicals, and elevated glass‐transition temperatures (T_g's). A series of styrenyl monomers bearing 2,5‐dithio‐1,3,4‐thiadiazole groups were prepared, and their reactivity was studied in solid‐state photopolymerization initiated by 2‐(4′‐methoxystyryl)‐4,6‐bis(trichloromethyl)‐1,3,5‐triazine. These monomers exhibited much higher polymerization rates than usual, and the final conversion nearly reached completion, despite the relatively high T_g of the solid‐state photopolymerization system. Even at temperatures below T_g, the polymerization proceeded without a ceiling phenomenon. These features were explained by intermolecular interactions between the monomers that induced monomer alignments effective for solid‐state polymerization, large excess free volumes arising from rotation around the methylthio groups, and intramatrix radical migration leading to encounters with the remaining monomers. © 2003 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 41: 3227–3242, 2003